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        China 2-target RF DC magnetron sputtering PVD coating device - China Supplier
        China 2-target RF DC magnetron sputtering PVD coating device - China Supplier China 2-target RF DC magnetron sputtering PVD coating device - China Supplier

        2-target RF DC magnetron sputtering PVD coating device

        Price:Negotiable
        Industry Category: Tools/Other-Tools
        Product Category: magnetron sputtering coating
        Brand: TN
        Spec: TN-MSP300S-RFDC


        Contact Info
        • Add:No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, , Henan, China, Zip: 450000
        • Contact: jibin wang
        • Tel:86 371 5519 9322
        • Email:wjb@cykeyi.com

        Other Products

        Description
        Additional Information

        Dual-target magnetron sputtering coater (with RF&DC power supply) TN-MSP300S-RFDC

        Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with a 500W DC power supply and a 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.

        The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

        Dual-target magnetron sputtering coater application:

        This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

        Dual-target magnetron sputtering coater technical parameters:

        Sample stage

        Size

        φ185mm

        Temperature control accuracy

        ±1℃

        Heating temperature

        Max 500℃

        Rotate speed

        1-20rpm adjustable

        Magnetron Sputtering   target head

        Quantity

        2”×2 (1”,2” optional)

        Water chiller

        Circulating water chiller   with flow rate of 10L/min

        Cooling mode

        Water cooling

         

         

        Vacuum chamber

        Chamber size

        φ300mm×300mm

        Watch window

        φ100mm

        Chamber material

        Stainless steel

        Opening mode

        Top cover open

        Mass flowmeter

        2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs)

        Vacuum system

        Model

        TN-GZK103-A

        Pumping interface

        KF40

        Molecular pump

        TN-600

        Exhaust interface

        KF16

        Backing pump

        rotary vane pump

        Vacuum measurement

        Compound vacuum gauge

        Ultimate vacuum

        1.0E-5Pa

        Power supply

        AC;220V 50/60Hz

        Pumping rate

        Molecular pump:   600L/S  rotary vane pump: 1.1L/S  

        Comprehensive gas pumping performance:   vacuum up to 1.0E-3Pa in 20 minutes

        Power configuration

        Quantity

        DC power supply×1

        RF power supply×1

        Max output power

        DC 500W, RF 300 W

        Other parameters

        Supply voltage

        AC220V,50Hz

        Overall size

        600mm×650mm×1280mm

        Total power

        2.5KW

        Total Weight

        About 300kg

         

         

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